Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With measuring – sensing – detection or process control means
Reexamination Certificate
2005-08-02
2005-08-02
Hassanzadeh, P. (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With measuring, sensing, detection or process control means
C156S345250, C156S345260, C156S345270, C156S345420, C156S047000, C156S345340, C118S712000, C118S713000, C118S7230ER, C216S067000, C438S710000, C356S445000
Reexamination Certificate
active
06923885
ABSTRACT:
A plasma processing apparatus having a sample bench located in a vacuum chamber, a structure disposed at a position opposed to a sample placed on the sample bench and facing a plasma generated in the vacuum chamber, and at least one through-hole disposed in the structure through which a gas flows into the vacuum chamber. An optical transmitter is mounted on a back of the at least one through-hole through which light from the sample passes, which light is detected by way of the optical transmitter.
REFERENCES:
patent: 4887548 (1989-12-01), Urata et al.
patent: 5045149 (1991-09-01), Nutty
patent: 5231464 (1993-07-01), Ichimura et al.
patent: 5578161 (1996-11-01), Auda
patent: 5759424 (1998-06-01), Imatake et al.
patent: 5851842 (1998-12-01), Katsumata et al.
patent: 6042650 (2000-03-01), Uesugi et al.
patent: 6113733 (2000-09-01), Eriguchi et al.
patent: 6261372 (2001-07-01), Shimizu
patent: 6562186 (2003-05-01), Saito et al.
patent: 4-148118 (1991-06-01), None
patent: 5-136098 (1993-06-01), None
patent: 8-96988 (1996-04-01), None
patent: 2000-299362 (2000-10-01), None
patent: WO 200013219 (2000-03-01), None
Enami Hiromichi
Kanekiyo Hiroshi
Masuda Toshio
Suehiro Mitsuru
Takahashi Kazue
Hassanzadeh P.
Kackar Ram N
LandOfFree
Plasma processing system and apparatus and a sample... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma processing system and apparatus and a sample..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing system and apparatus and a sample... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3455003