Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2003-08-28
2008-01-29
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
Reexamination Certificate
active
07322313
ABSTRACT:
A plasma processing apparatus M1is provided with a processing part20for supporting a pair of elongate electrodes30. The processing part20is provided with a plurality of pull bolts52(approach-deforming preventers) mutually spacedly arranged in the longitudinal direction of the electrode30. A head part of each pull bolt52is hooked on a rigid plate33through a bolt holder53, and a leg part thereof is screwed in the electrode30. Owing to this arrangement, the electrodes30can be prevented from being deformed by Coulomb's force.
REFERENCES:
patent: 4691137 (1987-09-01), Goto et al.
patent: 4880163 (1989-11-01), Kobayashi et al.
patent: 5185132 (1993-02-01), Horiike et al.
patent: 5908602 (1999-06-01), Bardos et al.
patent: 6429400 (2002-08-01), Sawada et al.
patent: 2001/0029893 (2001-10-01), Yajima et al.
patent: 2002/0006476 (2002-01-01), Yajima et al.
patent: 2004/0045504 (2004-03-01), Yajima et al.
patent: 0 448 098 (1991-09-01), None
patent: 63-51938 (1988-03-01), None
patent: S63-190171 (1988-08-01), None
patent: 5-226145 (1993-09-01), None
patent: 7-85997 (1995-03-01), None
patent: 8-111278 (1996-04-01), None
patent: 9-92493 (1997-04-01), None
patent: 9-255803 (1997-09-01), None
patent: H09-323221 (1997-12-01), None
patent: 10-41098 (1998-02-01), None
patent: 10-509833 (1998-09-01), None
patent: 11-251304 (1999-09-01), None
patent: 2000-133493 (2000-05-01), None
patent: 2001-168032 (2001-06-01), None
patent: 2001-288575 (2001-10-01), None
patent: 2002-18276 (2002-01-01), None
patent: 2002-85964 (2002-03-01), None
patent: 2002-158219 (2002-05-01), None
patent: 2002-237480 (2002-08-01), None
patent: 2002-353000 (2002-12-01), None
patent: WO 0223960 (2002-03-01), None
Patent Abstracts of Japan, publication No. 11-251304, publication date Sep. 17, 1999, 1 page.
Patent Abstracts of Japan, publication No. 09-092493, publication date Apr. 4, 1997, 1 page.
Patent Abstracts of Japan, publication No. 07-085997, publication date Mar. 31, 1995, 1 page.
Supplementary European Search Report dated Oct. 24, 2006; Application No. EP 03 79 1379 (3 pages).
Hino Mamoru
Mayumi Satoshi
Shimizu Harukazu
Yashiro Susumu
Crowell Michelle
Hassanzadeh Parviz
Osha & Liang LLP
Sekisui Chemical Co. Ltd.
LandOfFree
Plasma processing system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma processing system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3963966