Plasma processing system

Details Plasma processing system Plasma processing system

2008-09-30

2008-09-30

Tran, Thuy Vinh (Department: 2821)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C118S7230AN

Reexamination Certificate

active

11144386

ABSTRACT:
A plasma processing system includes a plasma processing chamber and a plasma confining portion for defining a plasma confined area in the processing chamber. The plasma confining portion includes a plurality of spaced-apart segments arranged in a structural array. An X-axis control portion is provided for moving the plasma confining portion in a direction to expand or contract the plasma confining area. The plasma confining portion typically includes a plurality of confining members disposed one another in a vertical plane and spaced from each other.

REFERENCES:
patent: 5534751 (1996-07-01), Lenz et al.
patent: 6019060 (2000-02-01), Lenz
patent: 6492774 (2002-12-01), Han et al.
patent: 6823815 (2004-11-01), Han et al.
patent: 6872281 (2005-03-01), Chen et al.
patent: 7033444 (2006-04-01), Komino et al.
patent: 7094315 (2006-08-01), Chen et al.
patent: 2005/0039682 (2005-02-01), Dhindsa et al.
patent: 7-22388 (1995-01-01), None
patent: 2003-0066595 (2003-08-01), None
English language abstract of the Japanese Publication No. 7-22388.
English language abstract of the Korean Publication No. 2003-0066595.

Affiliated with

Also associated with

Rating

Plasma processing system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma processing system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3923494