Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate
2008-09-04
2010-12-21
Meeks, Timothy H (Department: 1715)
Coating apparatus
Gas or vapor deposition
Multizone chamber
C118S715000, C118S733000, C427S569000, C427S230000, C427S237000, C427S238000
Reexamination Certificate
active
07854805
ABSTRACT:
A plasma processing plant for plastic bottles, having a vacuum chamber arranged inside the processing chamber and when a respective bottle opening is pressed against a valve, the valve will open and establish a connection between the interior of the bottle and the vacuum chamber, and the chambers are continuously sealed against one another in a gastight fashion. With such approach, the gas can be conducted more easily and the number of control mechanisms can be reduced.
REFERENCES:
patent: 3460590 (1969-08-01), Robbins
patent: 5308649 (1994-05-01), Babacz
patent: 6328805 (2001-12-01), Rius et al.
patent: 6818068 (2004-11-01), Guiffant et al.
patent: 2005/0233077 (2005-10-01), Lizenberg et al.
patent: 10331946 (2005-02-01), None
patent: 60022377 (2006-06-01), None
patent: 1391535 (2004-02-01), None
patent: WO-2006/005698 (2006-01-01), None
Search Report for German Patent Application No. 10 2007 045 141.7 dated Jun. 13, 2008.
Kraus Andreas
Krueger Jochen
Krones AG
Marshall & Gerstein & Borun LLP
Meeks Timothy H
Ripple Collette
LandOfFree
Plasma processing plant does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma processing plant, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing plant will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4225979