Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate
2005-05-10
2005-05-10
Hassanzadeh, Parviz (Department: 1763)
Semiconductor device manufacturing: process
Including control responsive to sensed condition
Optical characteristic sensed
C216S060000, C156S345240
Reexamination Certificate
active
06890771
ABSTRACT:
A plasma processing method using a spectroscopic processing unit. The method includes separating spectrally plasma radiation emitted from a vacuum process chamber into component spectra, converting the component spectra into a time series of analogue electric signals composed of different wavelength components at a predetermined period, adding together analogue signals of the different wavelength components, converting a plurality of added signals into digital quantities on a predetermined-period basis, digitally adding together the plurality of added and converted signals a plural number of times on a plural-signal basis, determining discriminatively an end point of a predetermined plasma process on the basis of a signal resulting from the digital addition, and terminating the predetermined plasma process.
REFERENCES:
patent: 4767495 (1988-08-01), Nishioka
patent: 5552016 (1996-09-01), Ghanayem
patent: 5648849 (1997-07-01), Canteloup et al.
patent: 5658418 (1997-08-01), Coronel et al.
patent: 5835226 (1998-11-01), Berman et al.
patent: 5928532 (1999-07-01), Koshimizu et al.
patent: 6081334 (2000-06-01), Grimbergen et al.
patent: 6153115 (2000-11-01), Le et al.
patent: 6207008 (2001-03-01), Kijima
patent: 6261470 (2001-07-01), Smith et al.
patent: 6297064 (2001-10-01), Koshimizu
patent: 6306669 (2001-10-01), Yano et al.
patent: 6383402 (2002-05-01), Smith et al.
patent: 6414499 (2002-07-01), Yano et al.
patent: 6586262 (2003-07-01), Saito et al.
patent: 20010016053 (2001-08-01), Dickson et al.
patent: 20030085198 (2003-05-01), Yi et al.
patent: 1 089 146 (2001-04-01), None
patent: 61-53728 (1986-03-01), None
patent: 63-200533 (1988-08-01), None
patent: 64-68932 (1989-03-01), None
patent: 5-179467 (1993-07-01), None
patent: 6-84849 (1994-03-01), None
patent: 8-274082 (1996-10-01), None
patent: 2000-97648 (2000-04-01), None
patent: 2000-106356 (2000-04-01), None
patent: 2000-228397 (2000-08-01), None
patent: 2000-324297 (2000-11-01), None
U.S. Appl. No. 09/793,624, filed Feb. 2001, Edamura.
U.S. Appl. No. 09/797,601, filed Mar. 2001, Usui.
U.S. Appl. No. 09/946,504, filed Sep. 2001, Usui et al.
CRC Handbook of Chemistry and Physics, D. Lide, CRC Pres, R.W.B. Pearse & A. G. Gaydon, “the Identification of Molecular Spectra”, J. Wiley & Sons, Inc., 1976.
S. Minami: “Waveform Data Processing for Scientific Measurements”, CQ Publication Co. of Japan, pp. 220-226 (1986).
K. Sasaki, et al, “Estimation of Component Spectral Curves from Unknown Mixture Spectra”, Appl. Opt., vol. 23, pp. 1955-1959 (1984).
Fujii Takashi
Kaji Tetsunori
Kimura Shizuaki
Usui Tatehito
Antonelli Terry Stout & Kraus LLP
Hassanzadeh Parviz
Hitachi , Ltd.
Hitachi High-Technologies Corporation
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