Electric heating – Metal heating – By arc
Reexamination Certificate
2007-03-12
2011-11-15
Hoang, Tu B (Department: 3742)
Electric heating
Metal heating
By arc
C219S121590, C219S121400, C219S121430, C216S026000, C216S067000
Reexamination Certificate
active
08058585
ABSTRACT:
A plasma processing method includes the steps of: loading a substrate on a lower electrode, the substrate having a resist mask formed on a transcription film; supplying a processing gas into a processing chamber; forming a magnetic field, which is oriented toward one direction and perpendicular to a line connecting an upper and the lower electrode; supplying a high frequency power to the lower electrode in the processing chamber to thereby form an electric field; converting the processing gas into a plasma by a magnetron discharge caused by a presence of an orthogonal electromagnetic field; and forming lenses on the transcription film by using the plasma. The high frequency power is supplied to the lower electrode while controlling the magnitude of the electric power divided by a surface area of the substrate to be in a range from about 1200 W/31415.9 mm2to 2000 W/31415.9 mm2.
REFERENCES:
patent: 5326404 (1994-07-01), Sato
patent: 5494522 (1996-02-01), Moriya et al.
patent: 5525159 (1996-06-01), Hama et al.
patent: 5578164 (1996-11-01), Kurono et al.
patent: 5834730 (1998-11-01), Suzuki et al.
patent: 5948281 (1999-09-01), Okazaki et al.
patent: 5997756 (1999-12-01), Okazaki et al.
patent: 6163407 (2000-12-01), Okazaki et al.
patent: 6700089 (2004-03-01), Hirooka
patent: 6818560 (2004-11-01), Koshimizu et al.
patent: RE39020 (2006-03-01), Hama et al.
patent: 2005/0061772 (2005-03-01), Amemiya
patent: 10-148704 (1998-06-01), None
patent: 2005-101232 (2005-04-01), None
Amemiya Hiroki
Nagahata Hiroshi
Toda Akihito
Hoang Tu B
Jennison Brian
Smith , Gambrell & Russell, LLP
Tokyo Electron Limited
LandOfFree
Plasma processing method, plasma processing apparatus and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma processing method, plasma processing apparatus and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing method, plasma processing apparatus and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4257054