Data processing: generic control systems or specific application – Specific application – apparatus or process
Reexamination Certificate
2007-12-25
2007-12-25
Bahta, Kidest (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
C315S111210
Reexamination Certificate
active
10937905
ABSTRACT:
With analysis data in the prior art, it is difficult to find out if a change regarded as a judgmental standard of the completion of seasoning has come from a change due to the seasoning, namely, change in condition of the interior of a processing container or come from another change based on a temperature change among respective dummy wafers and furthermore, it is difficult to judge whether the seasoning has been completed or not. Therefore, a plasma processing method of the present invention, which is a method for detecting the completion of seasoning in performing the seasoning by loading dummy wafers W into a processing container2of a plasma processing apparatus1,includes a process of creating a predictive formula for predicting the completion of seasoning and another process of detecting the completion of seasoning in performing the seasoning, based on the predictive formula. The creation of the predictive formula is accomplished by performing a multivariate analysis against a plurality of measured data that can be obtained by first supplying dummy wafers W into the processing container2,cooling down the interior of the processing container2and supplying a plurality of dummy wafers W into the processing container2again.
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Notification of Receipt of Record Copy (Form PCT/IB/301) issued in connection with PCT/JP03/02932.
Notification Concerning Submission or Transmittal of Priority Document (Form PCT/IB/304) issued in connection with PCT/JP03/02932.
Notification of Change of Name issued in connection with PCT/JP03/02932.
Notice Informing the Applicant of the Communication of the International Application to the Designated Offices issued in connection with PCT/JP03/02932.
Harada Satoshi
Takayama Naoki
Wang Bin
Bahta Kidest
Rapp Chad
Smith , Gambrell & Russell, LLP
Tokyo Electron Limited
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