Plasma processing method and plasma processing apparatus for...

Details Plasma processing method and plasma processing apparatus for... Plasma processing method and plasma processing apparatus for...

2007-03-16

2010-02-16

Chen, Kin-Chan (Department: 1792)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C438S714000, C216S059000

Reexamination Certificate

active

07662646

ABSTRACT:
In a plasma processing method, a correlation between substrate type data and optical data is obtained by using a multivariate analysis; substrate type data is obtained from optical data based on the correlation when initiating a plasma processing; and a substrate type is determined by using the obtained substrate type data. Further, a setting data set corresponding to the determined substrate type is selected from setting data sets, each for detecting a plasma processing end point of the plasma processing, each of the setting data sets being stored in advance in a data storage unit; an end point of the plasma processing is detected based on the selected setting data set; and the plasma processing is terminated at the detected end point.

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