Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent
1995-12-27
1997-10-14
Nguyen, Nam
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
20429805, 118723R, 118723HC, B05D 306
Patent
active
056770120
ABSTRACT:
A plasma processing apparatus comprises a vacuum chamber, a plasma beam generator arranged in the vacuum chamber, and a main hearth located in the vacuum chamber and is for carrying out a step of a plasma beam produced by the plasma beam generator to the main hearth. The plasma processing apparatus further comprises a permanent magnet and a hearth coil arranged in the vicinity of the main hearth to be concentric with a center axis of the main hearth to be concentric with a center axis of the main hearth. The meltability of a material and the flight distribution of the vapor particles derived from a vaporizable material are adjusted by varying an electric current supplied to the hearth coil.
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Patent Abstract of Japan, vol. 018, No. 351 (C-1220), 4 Jul. 1994 & JP-A-06 088216 (Nippon Sheet Glass Co Ltd), 29 Mar. 1994. (English Abstract).
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Patents Abstract of Japan, vol. 95, No. 005 & JP-A-07 138743 (Sumitomo Heavy Ind Ltd), 30 May 1995. (English Abstract).
Sakemi Toshiyuki
Tanaka Masaru
Nguyen Nam
Sumitomo Heavy Industrie's, Ltd.
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