Plasma processing method and plasma processing apparatus

Details Plasma processing method and plasma processing apparatus Plasma processing method and plasma processing apparatus

2006-01-10

2006-01-10

Evans, F. L. (Department: 2877)

Optics: measuring and testing

With plural diverse test or art

C356S326000, C700S028000, C156S324000, C118S7230AN

Reexamination Certificate

active

06985215

ABSTRACT:
In a plasma processing method and apparatus for monitoring information on a plasma processing, a multivariate analysis is performed by using as analysis data detection values detected for each object to be processed from a plurality of detection devices disposed in the processing apparatus upon the plasma processing. At that time, for each of sections defined whenever a maintenance of the processing apparatus is carried out, the detection values detected by the detection devices in the respective sections are compensated through a compensation unit, and the compensated detection values are taken as the analysis data.

REFERENCES:
patent: 6521080 (2003-02-01), Balasubramhanya et al.
patent: 2002/0009814 (2002-01-01), Usui et al.
patent: 2002-25878 (2002-01-01), None
patent: 2002-202806 (2002-07-01), None

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