Plasma processing method and plasma generator

Details Plasma processing method and plasma generator Plasma processing method and plasma generator

1995-09-25

1997-06-10

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

216 66, 216 67, 118 501, 118719, 438680, 438726, 438798, H01L 213065, C03C 2506

Patent

active

056371802

ABSTRACT:
A plasma-processing method used in processes for manufacturing semiconductor devices. During plasma processing, ultraviolet radiation is emitted from a region where a plasma is created. An ultraviolet radiation-blocking means blocks the ultraviolet radiation from impinging on the sample surface to protect it. The blocking means passes particles forming a plasma onto the sample surface. The particles passed through the ultraviolet radiation-blocking plates are implanted into the sample. Alternatively, the processed surface of the sample is etched, or a film is deposited on the processed surface of the sample.

REFERENCES:
patent: 3297465 (1967-01-01), Connell et al.
patent: 4526805 (1985-07-01), Yoshizawa
patent: 4776923 (1988-10-01), Spencer et al.
patent: 4836902 (1989-06-01), Kalnitsky et al.
Patent Abstracts of Japan, vol. 018, No. 626 (E-1636), Nov. 29, 1994 & JP-A-06 244159 (Hitachi Ltd), Sep. 2, 1994.
Patent Abstracts of Japan, E Field, vol. 8, No. 626, Nov. 29, 1994 (Nov. 29, 1994, p. 110 E, JP 6-244 159 A (Hitachi Ltd).

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