Plasma processing method and apparatus

Details Plasma processing method and apparatus Plasma processing method and apparatus

1990-10-31

1993-10-26

Lusignan, Michael

Stock material or miscellaneous articles

Self-sustaining carbon mass or layer with impregnant or...

468906, B32B 900

Patent

active

052564835

ABSTRACT:
A plasma process and an apparatus therefor are described. A number of substrates are disposed between a pair of electrodes, to which a high frequency electric power is applied in order to generate glow discharge and induce a plasma. The substrates in the plasma are applied with an alternating electric field. By virtue of the alternating electric field, the substrates are subjected to sputtering action.

REFERENCES:
patent: 4273828 (1981-06-01), Tracy et al.
patent: 4504519 (1985-03-01), Zeler
patent: 4701317 (1987-10-01), Arakawa et al.
patent: 4847157 (1989-07-01), Goodman et al.
patent: 4882256 (1989-11-01), Osawa et al.
patent: 4906544 (1990-03-01), Osawa et al.
patent: 4925701 (1990-05-01), Jansen et al.
patent: 5023068 (1991-06-01), Jones

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