Plasma processing method and apparatus

Details Plasma processing method and apparatus Plasma processing method and apparatus

2006-09-05

2006-09-05

Kackar, Ram N (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C156S345240, C156S345260, C156S345270, C156S345280, C118S708000, C118S712000, C204S192330, C204S298320

Reexamination Certificate

active

07101458

ABSTRACT:
In a plasma processing method and apparatus for monitoring an operating status of a plasma processing apparatus and/or a processing status of an object being processed, emission spectra emitted from a plasma is obtained as optical data when the plasma process is performed on the object. Quantitative data of each emission source is obtained from the obtained optical data by using reference data in a database storing therein emission spectra of a plurality of emission source as the reference data. The operating status of the plasma processing apparatus and/or the processing status of the object being processed is estimated based on changes in the quantitative data of each emission source.

REFERENCES:
patent: 5288367 (1994-02-01), Angell et al.
patent: 6521080 (2003-02-01), Balasubramhanya et al.
patent: 2003/0055610 (2003-03-01), Webber

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