Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1990-05-11
1991-01-22
Pianalto, Bernard
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
118723, 118 501, 118620, 430 58, B05D 306
Patent
active
049870041
ABSTRACT:
A plasma process and an apparatus therefor are described. A number of substrates are disposed between a pair of electrodes, to which a high frequency electric power is applied in order to generate glow discharge and induce a plasma. The substrates in the plasma are applied with an alternating electric field. By virtue of the alternating electric field, the substrates are subjected to sputtering action.
REFERENCES:
patent: 4749636 (1988-06-01), Iino et al.
Hamatani Toshiji
Imatou Shinji
Inushima Takashi
Itou Kenji
Kawano Atsushi
Pianalto Bernard
Semiconductor Energy Laboratory Co,. Ltd.
LandOfFree
Plasma processing method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma processing method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing method and apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1554240