Plasma processing method and apparatus

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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118723, 118 501, 118620, 430 58, B05D 306

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active

049870041

ABSTRACT:
A plasma process and an apparatus therefor are described. A number of substrates are disposed between a pair of electrodes, to which a high frequency electric power is applied in order to generate glow discharge and induce a plasma. The substrates in the plasma are applied with an alternating electric field. By virtue of the alternating electric field, the substrates are subjected to sputtering action.

REFERENCES:
patent: 4749636 (1988-06-01), Iino et al.

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