Plasma processing method and apparatus

Details Plasma processing method and apparatus Plasma processing method and apparatus

1999-04-02

2000-12-12

Padgett, Marianne

Coating apparatus

Gas or vapor deposition

With treating means

118723ME, 427562, 427575, 216 69, C23C 1400, H05A 124

Patent

active

061583839

ABSTRACT:
In a plasma processing method and apparatus, microwaves are radiated from a slot antenna set at the bottom of a resonator, a plasma is generated using the microwave and a sample is processed by the plasma. A plasma having a ring-form is generated by the microwaves radiated from the slot antennas, which are disposed at an angle which is neither in parallel to nor perpendicular to a surface current flowing on a slot antenna plate. Thereby, the sample is uniformly processed.

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patent: 5311103 (1994-05-01), Asmussen et al.
patent: 5531862 (1996-07-01), Otsubo et al.
patent: 5779802 (1998-07-01), Borghs et al.
patent: 5838111 (1998-11-01), Hayashi et al.

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