Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2003-01-27
2008-10-07
Hassanzadeh, Parviz (Department: 1792)
Coating apparatus
Gas or vapor deposition
With treating means
C118S7230MA, C118S7230MR, C156S345360, C156S345410, C156S345420, C156S345460
Reexamination Certificate
active
07430985
ABSTRACT:
Plasma processing equipment capable of increasing the heat resistance of a wave guide by using a high dielectric material, comprising a processing container44formed to allow vacuuming, a loading table46installed in the processing container for placing a processed body W thereon, a microwave transmission plate72installed in an opening part at the ceiling of the processing container, a flat antenna member76for feeding microwave into the processing container through the microwave transmission plate, a shield cover body80earthed so as to cover the upper part of the flat antenna member, and a waveguide90for feeding the microwave from a microwave generating source to the flat antenna member, characterized in that the waveguide is formed of a high dielectric waveguide94using the high dielectric material, whereby the heat resistance of the waveguide can be increased.
REFERENCES:
patent: 3078428 (1963-02-01), Miller
patent: 4216449 (1980-08-01), Kach
patent: 4441091 (1984-04-01), Nishida et al.
patent: 5523652 (1996-06-01), Sferlazzo et al.
patent: 5830591 (1998-11-01), Sengupta et al.
patent: 6109208 (2000-08-01), Tsuchihashi et al.
patent: 6329957 (2001-12-01), Shea et al.
patent: 6401653 (2002-06-01), Taniguchi et al.
patent: 6656322 (2003-12-01), Hongo et al.
patent: 6683517 (2004-01-01), Chiu et al.
patent: 2002/0011802 (2002-01-01), Espiau et al.
patent: 2003/0122633 (2003-07-01), Tsironis
patent: 58-221501 (1983-12-01), None
patent: 7-220897 (1995-08-01), None
patent: 9-92492 (1997-04-01), None
patent: 11-204296 (1999-07-01), None
patent: 2001-274150 (2001-10-01), None
patent: 2002-231637 (2002-08-01), None
patent: 2003-109797 (2003-04-01), None
Dhingra Rakesh K
Hassanzadeh Parviz
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Tokyo Electron Limited
LandOfFree
Plasma processing equipment does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma processing equipment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing equipment will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4017773