Plasma processing equipment

Details Plasma processing equipment Plasma processing equipment

2011-04-26

2011-04-26

Hassanzadeh, Parvis (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345410

Reexamination Certificate

active

07930992

ABSTRACT:
Resonance can be surely provided under any plasma condition in such a manner that an antenna (3) is arranged in an opening of an upper part of a chamber (1) to produce an electromagnetic field generated by a microwave, a top plate (4) for sealing the opening of the chamber (1) is provided under the antenna (3), a ring-shaped ridge (41) is provided on a lower surface of the top plate (4) such that a thickness thereof in a diameter direction is tapered so as to be varied sequentially. Thus, only one kind of top plate has the same effect as a top plate having various thicknesses, so that absorption efficiency to the plasma can be considerably improved and the plasma can be generated stably over a range from a high pressure to a low pressure.

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