Plasma processing device

Details Plasma processing device Plasma processing device

2003-05-30

2008-12-30

Owens, Douglas W. (Department: 2821)

Coating apparatus

Gas or vapor deposition

With treating means

C315S111210

Reexamination Certificate

active

07469654

ABSTRACT:
A plasma processing apparatus includes a chamber for carrying out plasma processing inside, a top plate made of a dielectric material for sealing the upper side of this chamber, and an antenna section that serves as a high frequency supply for supplying high frequency waves into the chamber via this top plate. The top plate is provided with reflecting members inside thereof. The sidewalls of the reflecting members work as a wave reflector for reflecting high frequency waves that propagate inside the top plate in the radius direction. Alternatively, no reflecting members may be provided in a manner in which the sidewalls of a recess of the top plate serve as a wave reflector.

REFERENCES:
patent: 6074516 (2000-06-01), Howald et al.
patent: 6320321 (2001-11-01), Ogura et al.
patent: 6583572 (2003-06-01), Veltrop et al.
patent: 6677549 (2004-01-01), Suzuki et al.
patent: 6713968 (2004-03-01), Ishii et al.
patent: 6729261 (2004-05-01), Hongo
patent: 6864640 (2005-03-01), Okumura et al.
patent: 2002/0038791 (2002-04-01), Okumura et al.
patent: 2003/0038791 (2003-02-01), Chou
patent: 08-138889 (1996-05-01), None
patent: 09-139380 (1997-05-01), None
patent: 09-232099 (1997-09-01), None
patent: 10-214823 (1998-08-01), None
patent: 2000-030897 (2000-01-01), None
patent: 2000-243707 (2000-09-01), None
patent: 2000-357683 (2000-12-01), None
patent: 2001-223171 (2001-08-01), None
patent: 2001-274149 (2001-10-01), None
patent: 2002-016052 (2002-01-01), None
patent: 2003-059919 (2003-02-01), None
patent: 2003-082467 (2003-03-01), None
patent: 2003-151797 (2003-05-01), None
patent: 2003-168681 (2003-06-01), None

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