Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1992-10-30
1994-03-08
Hearn, Brian E.
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
156643, 118723ER, H01L 2100
Patent
active
052923967
ABSTRACT:
Disclosed herein is a coaxial feeding-type plasma processing chamber or an opposed electrode-type plasma processing chamber using an Etch-tunnel comprising: a cylindrical treatment chamber having a gas-introducing mechanism and a gas-exhausting mechanism, and equipped with a heating mechanism at the periphery thereof; an external electrode disposed in close contact to the outer periphery of the cylindrical treatment chamber; and a metal cylindrical member disposed coaxially at a predetermined gap to the inner wall of the cylindrical treatment chamber and a having a plurality of small apertures in the side wall thereof,
the gas-introducing mechanism being composed of a gas-introducing pipe having a plurality of gas-blowout means and disposed along the longitudinal direction of the cylindrical treatment chamber, and a gas reservoir connected by way of a pipeline; the gas-exhausting mechanism being composed of a gas-exhausting pipe having a plurality of gas-suction apertures and disposed along the longitudinal direction of the cylindrical treatment chamber and a vacuum means connected by way of a pipeline; and at least the gas-exhausting pipe being disposed to the inside of the metal cylindrical member.
REFERENCES:
patent: 3879597 (1975-04-01), Bersin et al.
patent: 4062318 (1977-12-01), Ban et al.
patent: 4550239 (1985-10-01), Uehara et al.
patent: 4550242 (1985-10-01), Uehara et al.
patent: 5099100 (1992-03-01), Bersin et al.
Sakamoto Norio
Takashima Shigekazu
Baskin Jonathan D.
Hearn Brian E.
M. C. Electronics Co., Ltd.
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