Plasma processing apparatus with real-time particle filter

Details Plasma processing apparatus with real-time particle filter Plasma processing apparatus with real-time particle filter

2005-04-05

2005-04-05

Alejandro-Mulero, Luz (Department: 1763)

Chemistry: electrical and wave energy

Apparatus

Vacuum arc discharge coating

C118S7230HC

Reexamination Certificate

active

06875326

ABSTRACT:
A plasma processing device include a plasma generation unit for generating plasma by using a cathodic arc discharge, first and second magnetic field ducts arranged in a row for transporting the plasma with one end of the row being connected to the plasma generation unit and a processing chamber connected to the other end of the row unit and having a stage for holding a substrate to be processed. A shutter is provided for covering the plasma during a period of a predetermined time after start of arc discharge or during a period of predetermined time before end of arc discharge. The shutter is disposed between the first magnetic field duct and the substrate to be processed, and is movable. The shutter is capable of being supplied with a voltage, and is kept in a state so as to be electrically insulated from the processing chamber.

REFERENCES:
patent: 4217855 (1980-08-01), Takagi
patent: 5279723 (1994-01-01), Falabella et al.
patent: 5282944 (1994-02-01), Sanders et al.
patent: 5317235 (1994-05-01), Treglio
patent: 5468363 (1995-11-01), Falabella
patent: 5476838 (1995-12-01), Wordenweber et al.
patent: 5480527 (1996-01-01), Welty
patent: 6026763 (2000-02-01), Kim et al.
patent: 8-7219 (1996-01-01), None
patent: 8-333195 (1996-12-01), None
patent: 9626531 (1996-08-01), None

Affiliated with

Also associated with

Rating

Plasma processing apparatus with real-time particle filter does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma processing apparatus with real-time particle filter, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing apparatus with real-time particle filter will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3368485