Coating apparatus – Gas or vapor deposition – With treating means
Patent
1995-04-25
1996-06-04
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118723ME, 118723MR, 118723MA, 118723R, 20429807, C23C 1600
Patent
active
055229344
ABSTRACT:
A plasma processing apparatus comprises a susceptor for supporting a target object to be processed having a target surface to be processed in a process vessel, a plurality of process gas supply nozzles for supplying a process gas for the target object into the process vessel, and an RF coil for generating an electromagnetic wave in the process vessel to generate a plasma of the process gas. The supplying nozzles have process gas injection holes formed at a plurality of levels in a direction substantially perpendicular to the target surface of the target object in the process vessel, and the gas injection holes located at an upper level are closer to a center of the target surface than gas injection holes located at a lower level.
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Hata Jiro
Ishizuka Shuichi
Kawamura Kohei
Suzuki Akira
Breneman R. Bruce
Paladugu Ramamohan Rao
Tokyo Electron Limited
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