Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1991-09-30
1994-04-19
Hearn, Brian E.
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
156643, 118723, 20429804, 20429836, 20429816, H01L 2100
Patent
active
053042778
ABSTRACT:
A plasma processing apparatus includes a plasma processing chamber having a stage for placing a substrate to be plasma processed, an exhaust port and a gas introduction nozzle for plasma processing coupled therewith, and a cavity resonator for closing the plasma processing chamber in vacuum manner and coupled through a microwave introducing window through which microwaves are introduced and having slots for radiating microwaves to the plasma processing chamber. Microwaves having increased intensity of an electromagnetic field is supplied to the processing chamber to produce plasma to effect processing of the substrate. An area in which diffusion of plasma is suppressed to reduce loss is formed only in the vicinity of an inner wall of the processing chamber.
REFERENCES:
patent: 4776918 (1988-10-01), Otsubo et al.
patent: 4960073 (1990-10-01), Suzuki et al.
patent: 4985109 (1991-01-01), Otsubo et al.
patent: 5021114 (1991-06-01), Saito et al.
patent: 5032202 (1991-07-01), Tsai et al.
Ohara Kazuhiro
Otsubo Toru
Sasaki Ichirou
Goudreau George
Hearn Brian E.
Hitachi , Ltd.
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