Plasma processing apparatus using a partition panel

Coating apparatus – Gas or vapor deposition – With treating means

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118723ER, 118723E, 156345, C23C 1600

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active

06076483&

ABSTRACT:
A plasma processing apparatus has a plurality of annular permanent magnets arranged concentrically with the same polarity in the circumferential direction at the atmosphere side of a second electrode arranged opposite to a stage on which a specimen is placed. Arrangement is provided so that the magnets located adjacent radially have opposite polarity. Furthermore, permanent magnets are arranged at the outer circumference of a vacuum vessel corresponding to a plasma generation chamber portion. A plasma processing apparatus can be provided that allows formation of uniform plasma over a large area and uniform processing of a specimen of a large diameter.

REFERENCES:
patent: 4943361 (1990-07-01), Kakehi et al.
patent: 5108535 (1992-04-01), Ono et al.
patent: 5133825 (1992-07-01), Hakamata et al.
patent: 5279669 (1994-01-01), Lee
patent: 5476182 (1995-12-01), Ishizuka et al.
patent: 5665167 (1997-09-01), Deguchi et al.
patent: 5695597 (1997-12-01), Fujiwara
A. Van Oostrom vol. 17 No. 5, Sep. 1,1970, "Field-Induced surface Rearrangement in a Field-Ion Microscope" pp. 206-208.
Shinichi Tachi et al., Feb. 1988, "Low-Temperature Reactive Ion Etching and Microwave Plasma Etching of silicon" pp. 616-618.
A. M. Barklund et al. Received Sep. 17, 1990 accepted Dec. 14, 1990 "Plasma Jet Dry Etching Using Different Electrode Configurations".

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