Data processing: measuring – calibrating – or testing – Calibration or correction system – Signal frequency or phase correction
Reexamination Certificate
2008-03-28
2011-12-06
Tsai, Carol S (Department: 2857)
Data processing: measuring, calibrating, or testing
Calibration or correction system
Signal frequency or phase correction
C156S345240, C156S345280, C156S345470, C118S712000, C118S7230AN, C118S7230ER, C216S059000, C216S061000, C333S032000, C333S017300, C324S707000, C324S464000, C315S111210
Reexamination Certificate
active
08073646
ABSTRACT:
A plasma processing apparatus includes a radio frequency generator capable of adjusting a target output power level based on the set power level and the offset level to output radio frequency power; a chamber in which a plasma process is performed; and a power detection unit for measuring radio frequency power level fed to the matching unit. The plasma processing apparatus further includes a generator control unit for controlling the radio frequency power such that the radio frequency power level fed to the matching unit reaches the set power level by calculating the offset level based on the difference between the set power level and the power level measured by the power detection unit and transmitting the set power level and the offset level in digital form to the data input terminal of the radio frequency generator.
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Chinese Office Action issued Aug. 2, 2010, in Patent Application No. 200810086928.0 (with English-language translation).
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
Tsai Carol S
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