Plasma processing apparatus, matching box, and feeder

Details Plasma processing apparatus, matching box, and feeder Plasma processing apparatus, matching box, and feeder

1998-11-25

2000-12-05

Mills, Gregory

Coating apparatus

Gas or vapor deposition

With treating means

31511151, 31511121, C23C 1600, H01J 724, H01J 2100

Patent

active

06155202&

ABSTRACT:
In a plasma processing apparatus, in a matching circuit intervening between a high-frequency power source and a plasma excitation electrode for achieving impedance matching between the high-frequency power source and the plasma excitation electrode, one of the two electrodes which form a tuning capacitor also serves as the plasma excitation electrode. Alternatively, in a plasma processing apparatus, the side wall of a housing made from an electrically conductive member and accommodating a matching circuit intervening between a high-frequency power source and a plasma excitation electrode for achieving impedance matching between the high-frequency power source and the plasma excitation electrode and a feeder for supplying high-frequency electric power from the high-frequency power source to the plasma excitation electrode through the matching circuit is formed not in parallel to the feeder.

REFERENCES:
patent: 5433812 (1995-07-01), Cuomo et al.
patent: 5445709 (1995-08-01), Kojima et al.
patent: 5650032 (1997-07-01), Keller et al.

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