Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1996-09-06
1998-04-07
Powell, William
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
438710, 216 67, H01L 2100
Patent
active
057359938
ABSTRACT:
Disclosed herein is a plasma processing apparatus having a dielectric member through which electromagnetic-waves are introduced into the reaction vessel to excite a plasma therein. A metallic resistor plate 3 is buried in the dielectric member to reduce capacitive coupling components in the plasma and to function as the electromagnetic-wave transmitting and heating member. The metallic resistor plate 3 is provided with a DC power supply 5 and a current controller 7 for feeding a controlled direct current to the metallic ressitor plate so as to elevate and control the temperature of the dielectric member 2. Sputtering of the dielectric member is prevented by the reduction of the capacitive coupling component, while deposition of etching products on the dielectric is suppressed by the controlled heating of the dielectric, thereby alleviating the problem of contaminating particle generation and increasing etching condition stability.
REFERENCES:
patent: 5110438 (1992-05-01), Ohmi et al.
patent: 5272417 (1993-12-01), Ohmi et al.
NEC Corporation
Powell William
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