Plasma processing apparatus for adjusting plasma processing...

Details Plasma processing apparatus for adjusting plasma processing... Plasma processing apparatus for adjusting plasma processing...

2005-01-11

2005-01-11

Hassanzadeh, Parviz (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C156S345250, C118S712000

Reexamination Certificate

active

06841032

ABSTRACT:
A plasma processing apparatus for processing an object arranged within a chamber by utilizing the plasma caused within the chamber, the apparatus including: a sensor having plural lines of a plurality of elements for detecting a plurality of strip-like beams; an application unit for applying the plurality of strip-like beams generated from the light within the chamber in such a way that each of the illumination faces of the strip-like beams makes an angle with respect to each of the lines of the elements; and a control unit for adjusting the operation of the apparatus using outputs from the sensor.

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patent: A-2001-60585 (2001-03-01), None
patent: A-2002-5837 (2002-01-01), None

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