Plasma processing apparatus capable of detecting and regulating

Details Plasma processing apparatus capable of detecting and regulating Plasma processing apparatus capable of detecting and regulating

1992-07-24

1994-05-24

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419233, 156345, C23C 1434, C23F 102

Patent

active

053146034

ABSTRACT:
A plasma processing apparatus has a process chamber and a pair of electrodes provided in the process chamber to oppose each other. An RF power supply outputs an RF power to be supplied to at least one of the pair of electrodes in the process chamber. A power detector detects an actual RF power to be applied to one of the electrodes in the process chamber. A controller controls the RF power output from the RF power supply to a predetermined value in accordance with the actual RF power detected by the power detector.

REFERENCES:
patent: 4500408 (1985-02-01), Boys et al.
patent: 4626312 (1986-12-01), Tracy
patent: 4871421 (1989-10-01), Ogle et al.
patent: 5116482 (1992-05-01), Setoyama et al.

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