Plasma processing apparatus and method of measuring amount...

Details Plasma processing apparatus and method of measuring amount... Plasma processing apparatus and method of measuring amount...

2011-08-09

2011-08-09

Kackar, Ram N (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C156S345240, C156S345250, C156S345260, C118S712000

Reexamination Certificate

active

07993487

ABSTRACT:
In the present invention, two coil-shaped probes each detecting the intensity of a magnetic field in a direction around a center axis of a processing space are provided in a process vessel of a plasma processing apparatus. Each of the probes detects an induced electromotive force generated in the coil, and a computer calculates an amount of radio-frequency current from the induced electromotive force, based on a predetermined calculation principle. A difference between the amounts of the radio-frequency current detected by the probes is calculated, and a loss radio-frequency current amount passing out of a plasma area between upper and lower electrodes is calculated, whereby the flow of the radio-frequency current in the plasma is known.

REFERENCES:
patent: 6878233 (2005-04-01), Hirose
patent: 2006/0249729 (2006-11-01), Mundt et al.
patent: 2002-43402 (2002-02-01), None

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