Plasma processing apparatus and method

Details Plasma processing apparatus and method Plasma processing apparatus and method

2006-11-28

2006-11-28

Hassanzadeh, Parviz (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345360, C156S345410, C315S111210

Reexamination Certificate

active

07140321

ABSTRACT:
A plasma processing apparatus includes a vacuum chamber that accommodates an object to be processed, and provides a plasma process to the object in a vacuum or reduced pressure environment, a dielectric for transmitting microwaves to the vacuum chamber and for maintaining the vacuum or reduced environment of the vacuum chamber, a plate that has slots for guiding the microwaves to the dielectric, and a temperature control mechanism that has a cooling channel between the plate and the dielectric, and controls temperature of the dielectric.

REFERENCES:
patent: 6059922 (2000-05-01), Yamazaki et al.
patent: 6729261 (2004-05-01), Hongo
patent: 6736930 (2004-05-01), Hongoh
patent: 2002/0193034 (2002-12-01), Ota
patent: 02302507 (1990-12-01), None
patent: 8-274067 (1996-10-01), None
patent: 10-340892 (1998-12-01), None

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