Plasma processing apparatus and method

Details Plasma processing apparatus and method Plasma processing apparatus and method

2005-06-21

2005-06-21

Hassanzadeh, Parviz (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C156S345250, C118S712000

Reexamination Certificate

active

06908529

ABSTRACT:
A plasma processing system for processing a workpiece by using plasma generated in a chamber, includes a light transmissive member disposed in the chamber, the workpiece being disposed inside the light transmissive member; and a light receiving unit mounted on the chamber for receiving light inside the light transmissive member, wherein a state of processing the workpiece is detected by using data detected from light inside the light transmissive member before processing the workpiece and data detected from light inside the light transmissive member generated during processing the workpiece. A plasma processing method and system is provided which facilitates an operation of the system and executes a reliable processing.

REFERENCES:
patent: 5658423 (1997-08-01), Angell et al.
patent: 5980767 (1999-11-01), Koshimizu et al.
patent: 6245190 (2001-06-01), Masuda et al.
patent: 05259250 (1993-10-01), None
patent: A-10-125660 (1998-05-01), None
patent: A-11-87323 (1998-11-01), None

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