Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2011-02-15

2011-02-15

Hassanzadeh, Parviz (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C118S715000, C118S716000, C118S722000, C118S7230AN, C156S345430, C156S345450, C156S345510

Reexamination Certificate

active

07886689

ABSTRACT:
To prevent occurrence of arcing caused by difference of thermal expansion between the electrode and the solid dielectric in a plasma processing apparatus.The bottom part of a casing20of processing units10L,10R is open, this opening part is closed with a solid dielectric plate50, and an electrode30is received in the casing20such that the electrode30is free in the longitudinal direction. The solid dielectric plate50has such strength as capable of supporting the dead weight of the electrode30solely by itself. The electrode30is placed on the upper surface of the solid dielectric plate50is a non-fixed state such that the dead weight of the electrode30is almost totally applied to the solid dielectric plate50.

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