Coating apparatus – Gas or vapor deposition – With treating means
Patent
1995-10-20
1997-07-08
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118723ME, 20429838, C23C 1600
Patent
active
056456441
ABSTRACT:
A plasma processing apparatus comprises means of supplying the microwave, a reaction chamber having a microwave lead-in opening, a microwave window for introducing the microwave provided by the microwave supply means into the reaction chamber through the microwave lead-in opening, and a supporting member having beams for supporting the microwave window. The apparatus has its microwave window divided in correspondence to areas of the supporting member divided by the beams. The apparatus can have a larger microwave window which is reinforced by the beams against the pressure at plasma generation, and is capable of processing large semiconductor substrates and glass substrates for liquid crystal display panels stably and uniformly.
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Komachi Kyoichi
Mabuchi Hiroshi
Miyamura Tadashi
Yoshiki Takahiro
Breneman R. Bruce
Chang Joni Y.
Sumitomo Metal Industries Ltd.
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