Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1997-08-04

2000-01-25

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723IR, 118723AN, 156345, C23C 1600

Patent

active

060167653

ABSTRACT:
A plasma processing apparatus is furnished with a reactor which is furnished with a susceptor 12, a reaction gas delivery mechanism which delivers reaction gas to the inside of the reactor, a pumping mechanism 24 which pumps out an interior of the reactor, and a plasma-generating mechanism. The reactor is made of metal, the plasma-generating mechanism includes an at least single-winding coil 16 which produces an induced electric field, and the coil is established within the reactor and surrounding the plasma-generating space in a state surrounded by dielectrics parts 15 and 17.

REFERENCES:
patent: 5268200 (1993-12-01), Steger
patent: 5614055 (1997-03-01), Fairbairn et al.
patent: 5647913 (1997-07-01), Blalorn
patent: 5683548 (1997-11-01), Hartiz et al.
patent: 5716451 (1998-02-01), Hama et al.
patent: 5763851 (1998-06-01), Forster et al.
patent: 5792272 (1998-08-01), van Os et al.
patent: 5800621 (1998-09-01), Redener et al.

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