Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1987-10-20

1988-10-11

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118 501, 118623, 118728, 156643, 156646, 204298, 427 38, B44C 122, C03C 1500, B05D 306, C23C 1400

Patent

active

047769181

ABSTRACT:
Microwaves supplied from a magnetron through a waveguide are resonated in a cavity resonator to increase their amplitude. The resonated microwaves are emitted into a plasma production chamber through slits and a wall. Then plasma is produced in the plasma production chamber into which plasma processing gas is introduced. The plasma is employed for uniformly processing a substrate.

REFERENCES:
patent: 4430138 (1984-02-01), Suzuki et al.
patent: 4492620 (1985-01-01), Matsuo et al.
Handotai Kenkyu, No. 18, pp. 121-137 and 145-169, 1982.
H. Abe, Microwave Technique, pp. 71-74, 105-108 and 143-145.

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