Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1991-10-31

1993-10-12

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

31511121, 31323131, 250423R, H05H 102

Patent

active

052528928

ABSTRACT:
A plasma processing apparatus includes a filament mounted in an electron generation chamber for producing plasma of a discharge gas, thereby generating electrons. The electrons are supplied from the electron generation chamber into an ion generation chamber through electron passage hole between both chambers to produce plasma of a processing gas inside the ion generation chamber. The chambers are formed of conductive ceramics to constitute electrodes.

REFERENCES:
patent: 4841197 (1989-06-01), Takayama et al.
patent: 4950956 (1990-08-01), Asamaki et al.
patent: 5028791 (1991-07-01), Koshiishi et al.
patent: 5049784 (1991-09-01), Matsudo
patent: 5083061 (1992-01-01), Koshiishi et al.
patent: 5089747 (1992-02-01), Koshiishi et al.
patent: 5097179 (1992-03-01), Takayama et al.
patent: 5101110 (1992-03-01), Matsudo et al.

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