Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1997-06-18

1999-01-12

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723MP, 118723MR, 118723MA, H05H 1300

Patent

active

058581626

ABSTRACT:
A plasma processing apparatus including a chamber, a device for exhausting the chamber, an electrode, which is provided within the chamber, for mounting a workpiece to be processed, a device for generating a bias electric field near a wall surface of the chamber, a device for generating a magnetic field substantially parallel to the chamber wall to thereby generate a magnetron discharge by the interaction between the bias electric field and the magnetic field, and a device for providing a high frequency into the chamber.

REFERENCES:
patent: 4808258 (1989-02-01), Otsubo et al.
patent: 4960071 (1990-10-01), Akahori et al.
patent: 4999320 (1991-03-01), Douglas
patent: 5087857 (1992-02-01), Ahn
patent: 5221403 (1993-06-01), Nozawa et al.
patent: 5279669 (1994-01-01), Lee
patent: 5292370 (1994-03-01), Tsai et al.

Affiliated with

Also associated with

Rating

Plasma processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1510639