Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1999-02-08

2000-11-21

Pyon, Harold

Coating apparatus

Gas or vapor deposition

118728, 118729, 414935, C23C 1600

Patent

active

061487627

ABSTRACT:
A plasma processing apparatus for stably and uniformly performing various kinds of processing by preventing unnecessary plasma discharge in the processing comprises a susceptor pin for supporting a substance to be processed, the susceptor pin being disposed to pass through a hole formed to a susceptor, projecting from the upper surface of the susceptor when the susceptor falls and falling by its own weight when the susceptor rises so as to be buried in the hole, and a guide for guiding the rising and falling directions of the susceptor pin, wherein the susceptor pin and the guide are composed of ceramics.

REFERENCES:
patent: 5558717 (1996-09-01), Zhao et al.
patent: 5848670 (1998-12-01), Salzman
patent: 5935334 (1999-08-01), Fong et al.

Affiliated with

Also associated with

Rating

Plasma processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1248137