Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1998-01-07

2000-02-01

Jeffery, John A.

Electric heating

Metal heating

By arc

118723MP, B23K 900

Patent

active

060205709

ABSTRACT:
A plasma is supplied from a plasma source to a space between an upper electrode plate and a lower electrode plate disposed opposite to and in parallel with the upper electrode plate when producing a plasma in the space between the electrode plates for plasma processing by applying radio-frequency power to the electrode plates. The plasma source produce a plasma by inductively coupled discharge, radio-frequency discharge or microwave discharge. A plasma processing apparatus is obtained which is capable of producing a parallel-plate plasma by discharge in a space of a relatively low pressure and is capable of processing a large diameter workpiece uniformly at a high processing rate.

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