Electric lamp and discharge devices: systems – Plural power supplies – Diverse-type current supplies
Patent
1986-05-09
1989-03-14
Moore, David K.
Electric lamp and discharge devices: systems
Plural power supplies
Diverse-type current supplies
31511121, 31511131, 315115, 315108, 315175, 427 38, 204298, C23C 1500
Patent
active
048127124
ABSTRACT:
A plasma processing apparatus wherein a means is provided to apply the proper negative DC voltage through a filter circuit to an electrode for generating the low-temperature plasma through the feed of the high-frequency power. When the high-frequency power has been fed in the higher high-frequency power density to the electrode for generating the low temperature plasma, the sparks (abnormal discharge) easy to be generated are prevented from being caused to generate the stable low-temperature plasma for better plasma processing.
REFERENCES:
patent: 3988566 (1976-11-01), Vogts et al.
patent: 4201579 (1980-05-01), Robinson et al.
patent: 4292384 (1981-09-01), Straughan et al.
patent: 4434387 (1984-02-01), MacMaster et al.
patent: 4602193 (1986-07-01), Patonay et al.
patent: 4630566 (1986-12-01), Asmussen et al.
Mizuguchi Shinichi
Ohnishi Youichi
Okuda Akira
Shima Hiromi
Matsushita Electric - Industrial Co., Ltd.
Moore David K.
Powell Mark R.
LandOfFree
Plasma processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-895474