Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...
Patent
1985-06-12
1987-05-26
Terapane, John F.
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
With means applying electromagnetic wave energy or...
118730, 118732, 118729, 118715, 42218606, 42218607, 42218604, 422906, B01J 1908, C23C 1600
Patent
active
046684794
ABSTRACT:
The present invention relates to a plasma processing apparatus comprising a housing chamber which accommodates substances to be painted made of synthetic resin, a rotating support base which is provided in the housing chamber and rotates the substance to be painted, a plurality of hangers which are placed on the rotating support base and supports the substance to be painted, at least one plasma injection tube which is provided in the housing chamber and giving plasma processing to the surface of substance by injecting plasma gas thereto, and a variable speed drive means which rotates the rotating support base at the speed in accordance with a size and a number of substances to be painted.
REFERENCES:
patent: 4560462 (1985-12-01), Radford et al.
patent: 4584965 (1986-04-01), Ogisu
Manabe Katsuhide
Ogisu Yasuhiko
Terapane John F.
Toyoda Gosei Co,., Ltd.
Wolffe Susan
LandOfFree
Plasma processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-702678