Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2008-09-02

2011-10-18

Hassanzadeh, Parviz (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With plasma generation means remote from processing chamber

C118S7230ER, C118S7230ER, C118S7230MW, C118S7230ME, C118S7230MR, C118S7230IR, C118S7230IR, C156S345190, C156S345430, C156S345440, C156S345470

Reexamination Certificate

active

08038836

ABSTRACT:
A plasma processing apparatus includes a barrier wall member disposed between a plasma generation chamber and a processing chamber to separate the plasma generation chamber from the processing chamber. The barrier wall member assumes a fin structure achieved by disposing in a radial pattern numerous plate-like fin members extending from a central area thereof toward a peripheral edge. An upper end portion of each fin member overlaps a lower end portion of an adjacent fin member. The fin members are disposed with gaps formed between them and are made to range upward with a tilt along the circumferential direction.

REFERENCES:
patent: 6093281 (2000-07-01), Wise et al.
patent: 6170431 (2001-01-01), DeOrnellas et al.
patent: 6197165 (2001-03-01), Drewery et al.
patent: 6250880 (2001-06-01), Woodard et al.
patent: 2004/0028837 (2004-02-01), Fink
patent: 2002-83803 (2002-03-01), None
patent: 2006-73722 (2006-03-01), None
patent: WO 2006/025123 (2006-03-01), None

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