Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2007-02-28

2011-10-11

Chen, Keath (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345270

Reexamination Certificate

active

08034181

ABSTRACT:
A plasma processing apparatus includes a processing chamber encased in a vacuum vessel equipped with an evacuator; a sample stage located in the processing chamber and having an upper surface on which a sample as an object to be processed rests; a gas feeding unit for feeding processing gas into the processing chamber; a plurality of refrigerant ducts which are laid out in the internal of the sample stage and through which liquid refrigerant flows and can be evaporated; a cooling circuit including a compressor, a condenser, an expansion valve and a set of pipelines to connect the compressor, the condenser and the expansion valve in this order; and a selecting unit for selectively feeding the refrigerant through the plural refrigerant ducts in the different steps of the processing. The sample is processed by using plasma while the temperature of the sample stage is being controlled by the cooling circuit.

REFERENCES:
patent: 6951587 (2005-10-01), Narushima
patent: 2004/0097088 (2004-05-01), Kitayama et al.
patent: 2005/0045104 (2005-03-01), Arai et al.
patent: 2005/0279384 (2005-12-01), Guidotti
patent: 2006/0285270 (2006-12-01), Lee
patent: 06-346256 (1994-12-01), None
patent: 2005-089864 (2005-04-01), None

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