Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2008-10-20

2010-12-14

MacArthur, Sylvia R. (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345450, C156S345470

Reexamination Certificate

active

07849815

ABSTRACT:
This application discloses a practical plasma processing apparatus capable of plasma confinement without plasma-density non-uniformity and electric power loss. The apparatus comprises a plasma shield that surrounds a plasma generation region to prevent plasma from diffusing. The shield has at least one opening. The apparatus comprises a diffusion prevention electrode for preventing the plasma from diffusing through the opening of the plasma shield. The surface of the plasma shield exposed to the plasma is made of insulator. The diffusion prevention electrode is located where electrons diffusing toward the opening or having diffused through the opening from the plasma flow into itself.

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