Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2007-03-27

2010-02-02

Deo, Duy-Vu N (Department: 1792)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C156S345250, C156S345440, C156S345480

Reexamination Certificate

active

07655110

ABSTRACT:
In the present invention, a probe which detects a time varying magnetic flux density in a direction around a center axis of a processing space is provided in a process vessel of a plasma processing apparatus. The probe detects an induced electromotive force generated in a coil as the time varying magnetic flux density, and a computer calculates an amount of radio-frequency current in the process vessel from the induced electromotive force, based on a predetermined calculation principle.

REFERENCES:
patent: 5099790 (1992-03-01), Kawakami
patent: 5273610 (1993-12-01), Thomas et al.
patent: 6878233 (2005-04-01), Hirose
patent: 2006/0145693 (2006-07-01), Buttle et al.
patent: 2002-43402 (2002-02-01), None

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