Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2007-03-27

2008-10-07

Paschall, Mark H (Department: 3742)

Electric heating

Metal heating

By arc

C219S121540, C219S121430, C156S345470

Reexamination Certificate

active

07432467

ABSTRACT:
A plasma processing apparatus performs a desired plasma processing on a target substrate by using a plasma generated from a processing gas by forming a high frequency electric field in an evacuable processing chamber having an electrode. The plasma processing apparatus includes a high frequency power supply for outputting a high frequency power; and a central power feeder connected with a central portion of a rear surface of the electrode to supply the high frequency power from the high frequency power supply to the electrode. The plasma processing apparatus further includes a peripheral power feeder connected with a peripheral portion of the rear surface of the electrode in parallel with the central power feeder to supply the high frequency power from the high frequency power supply to the electrode.

REFERENCES:
patent: 5464499 (1995-11-01), Moslehi et al.
patent: 5494522 (1996-02-01), Moriya et al.
patent: 2004/0194890 (2004-10-01), Moroz
patent: 6-283474 (1994-10-01), None

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