Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With plasma generation means remote from processing chamber
Reexamination Certificate
2007-12-25
2007-12-25
McDonald, Rodney G. (Department: 1753)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With plasma generation means remote from processing chamber
C156S345410, C118S7230MW, C118S7230ME, C118S7230MR, C118S7230AN, C204S298380
Reexamination Certificate
active
10681615
ABSTRACT:
A plasma processing apparatus comprises: a chamber12having at least one opening and for generating plasma; a dielectric member14provided to cover the opening air-tightly; at least one wave guide16provided in the exterior of the chamber such that the one end side opposes the dielectric member; an electromagnetic wave source20provided on the other end side of the wave guide; a plurality of holes38, 40, 42, 44, 46provided on a surface opposing the dielectric member of the wave guide; and hole area adjusting means18provided in at least one of the above-mentioned holes so as to adjust the opening area of the hole.
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Machine translation of Noguchi (2001-203099).
Azuma Kazufumi
Goto Masashi
Nakata Yukihiko
Okamoto Tetsuya
Graybeal Jackson Haley LLP
Kabushiki Kaisha Ekisho Sentan Gijutsu Kaihatsu Center
McDonald Rodney G.
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