Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With plasma generation means remote from processing chamber
Reexamination Certificate
2007-06-05
2007-06-05
Hassanzadeh, Parviz (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With plasma generation means remote from processing chamber
C156S345410, C156S345420, C156S345460, C156S345490, C118S7230MW
Reexamination Certificate
active
10498672
ABSTRACT:
A plasma processing apparatus includes an evacuatable processing vessel; a workpiece mount base for mounting thereon an object to be processed; a microwave transmitting plate provided in an opening of a ceiling of the processing vessel; a planar antenna member for supplying a microwave into the processing vessel via the microwave transmitting plate; a shield lid grounded to cover a top of the planar antenna member; a waveguide for guiding the microwave to the planar antenna member; a member elevating mechanism for relatively varying a vertical distance between the planar antenna member and the shield lid; a tuning rod insertable into the waveguide; a tuning rod driving mechanism for moving the tuning rod to adjust an insert amount thereof; and a matching control section for controlling an elevation amount of the planar antenna member and the insert amount of the tuning rod to obtain a matching adjustment.
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Adachi Hikaru
Kasai Shigeru
Osada Yuki
Yamamoto Nobuhiko
Dhingra Rakesh
Hassanzadeh Parviz
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Tokyo Electron Limited
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