Coating apparatus – Gas or vapor deposition – With treating means
Patent
1995-07-21
1997-01-07
Nguyen, Nam
Coating apparatus
Gas or vapor deposition
With treating means
118719, 118723I, C23C 1600
Patent
active
055912680
ABSTRACT:
An apparatus for manufacturing a semiconductor device having: a process chamber capable of being evacuated; a coil unit for generating an alternating magnetic field in the process chamber; a conductive partition unit disposed in the process chamber for defining an inner space and generating another alternating magnetic field which cancels a change in the alternating magnetic field generated in the inner space, the partition unit allowing gas to be transported between the inner space and a space outside of the inner space; a pipe for supplying process gas to the process chamber; and a pipe for exhausting gas from said process chamber. The gas supply pipe and gas exhaust pipe have a plurality of openings directed to the inner space. Radicals are efficiently generated by inductively coupled plasma, and efficiently transported by a gas flow into time inner space.
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Chiba Shou
Usui Kaoru
Chang Joni Y.
Fujitsu Limited
Nguyen Nam
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