Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1994-05-06
1997-01-14
Gorgos, Kathryn
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
204164, H05H 124, B29C 5914
Patent
active
055935508
ABSTRACT:
This invention relates to the preferential glow discharge at the inside diameter (ID) of plastic tubing, particularly very small tubing.
REFERENCES:
patent: 4261806 (1981-04-01), Asai et al.
patent: 4432377 (1984-02-01), Dickhudt
patent: 4488954 (1984-12-01), Hatada
patent: 4576174 (1986-03-01), Miyazaki et al.
patent: 4692347 (1987-09-01), Yasuda
patent: 4718907 (1988-01-01), Karwoski
patent: 4752426 (1988-06-01), Cho
patent: 4846101 (1989-07-01), Montgomery
patent: 4927676 (1990-05-01), Williams
patent: 4948628 (1990-08-01), Montgomery
patent: 4976720 (1990-12-01), Machold et al.
patent: 5133422 (1992-07-01), Coury
patent: 5133986 (1992-07-01), Blum
patent: 5198033 (1993-03-01), Kelley
patent: 5223308 (1993-06-01), Doehler
patent: 5244654 (1993-09-01), Narayanan
patent: 5308319 (1994-05-01), Ide et al.
Plasma Polymerization and Plazma Treatment, Jnl. of Applied Polymer Science: Applied Polymer Symposium 38 an Interscience Publication, "Semicontinuous Plasma Polymerization Coating Onto the Inside Surface of Plastic Tubing " by Matsuzawa and Yasuda, pp. 65-74, 1984 (no month available).
Di Domenico Edward
Keeney Kenneth W.
Morris Mary M.
Stewart Mark T.
Gorgos Kathryn
Latham Daniel W.
Mayekar Kishor
Medtronic Inc.
Patton Harold R.
LandOfFree
Plasma process for reducing friction within the lumen of polymer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma process for reducing friction within the lumen of polymer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma process for reducing friction within the lumen of polymer will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1385423